| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_385752f237551ca1b257f160a0f2434b |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
1994-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_191522f046bcc0166642306fc84b007f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e2dd711e0514c0145e69b8c1c4c8870b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1497b2673ba4d8a841aeafdd50f52ee5 |
| publicationDate |
1996-07-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-H08179499-A |
| titleOfInvention |
Positive resist solution |
| abstract |
(57) [Outline] The positive resist solution of the present invention comprises a solvent containing an alkali-soluble resin, a 1,2-quinonediazide compound and propylene glycol alkyl ether propionate. [Effect] The positive resist solution of the present invention can form a resist film having a uniform thickness by applying the positive resist solution onto a substrate having a large diameter by a spin coating method. The formed resist film has excellent sensitivity and resolution. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109456230-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006145734-A |
| priorityDate |
1994-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |