http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H08179118-A

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1335
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-20
filingDate 1994-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1aac5d2b30f8dadc9a0159981d3112ea
publicationDate 1996-07-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H08179118-A
titleOfInvention Color filter manufacturing method
abstract (57) [Abstract] [Purpose] A method for producing a color filter having excellent heat resistance, in which a highly precise multicolor fine pattern of uniform thickness is formed on a substrate with good followability and workability of a photosensitive film. I will provide a. [Structure] A photosensitive film comprising a base film and a photosensitive resin layer colored in one color on a transparent substrate, A multicolor pattern is formed by repeating the steps of (1) laminating the colored photosensitive resin layer so as to face the substrate, (2) exposing in a pattern, and (3) at least a developing step. A method of manufacturing a color filter, wherein a step of forming a space between pixels and adhering is performed so that a colored photosensitive resin layer of a second color or later faces the substrate, and the second or subsequent colors are colored. In a method of manufacturing a color filter in which a multicolor pattern is formed by performing a transfer process of transferring a photosensitive resin layer from a base film to a space between pixels by heating, the area of the black matrix is less than 20% of the area of the pixel (opening). The ratio is 80% or more).
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104407504-A
priorityDate 1994-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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