| abstract |
(57) [Summary] [Structure] A positive resist material containing a spirobiindane derivative represented by the formula (1) and the derivative as a dissolution inhibitor. (In the formula, R 1 represents a protecting group that can be easily removed under acidic conditions, R 2 represents a hydrogen atom, an alkyl group, an alkoxy group, a nitro group or a halogen atom, and m represents 1 or 2, (n represents an integer of 1 to 3) [Effect] A positive resist material for high energy rays having excellent sensitivity and resolution is provided. |