Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_25ba42e5f214f100f81e5e2016f045ce |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-72 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B25-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-34 |
filingDate |
1994-12-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e4f619eedbcaba9a1b92e4939100d2f4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4c9bb8da6bdcd209a1d6496abe633b66 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ccc4f9224878ce71c65da4ea70166882 |
publicationDate |
1996-07-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-H08173759-A |
titleOfInvention |
Exhaust gas treatment agent |
abstract |
(57) [Summary] [Objective] An inorganic group V compound in the exhaust gas of a III-V group compound semiconductor thin film manufacturing process is treated safely by reducing heat generation. [Structure] An exhaust gas treating agent is prepared by mixing basic copper carbonate with anatase-type fine titanium oxide particles. Basic copper carbonate renders the inorganic group V compound harmless. The anatase type fine particle titanium oxide improves the moldability during production. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006508798-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8568672-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012107201-A1 |
priorityDate |
1994-12-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |