| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1af8df51ce24ca931ae718fb747f6aa0 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
1994-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f4ccaf356da6f8c6ed8d980f79f39ff2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cb231e84a0ccb5459a8550de687bfb68
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_385e568ecd9fcd822a12b63fa1705302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1b1414926d3775be696d39dc9f3c37f9 |
| publicationDate |
1996-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-H08167555-A |
| titleOfInvention |
X-ray mask, method of manufacturing the mask, and device manufacturing method using the mask |
| abstract |
(57) [Abstract] [Purpose] To provide a mask for X-ray lithography, which is excellent in temporal and process stability. The absorber pattern formed on the mask membrane, which is an X-ray transparent film, is an alloy containing tungsten (W) and molybdenum (Mo). |
| priorityDate |
1994-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |