| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-022 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
1994-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_601ba4a71019c4ad5d4dff3748ba6624
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_abf92c6162f276a54a5782dd87f205c1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_82d2e7bd7d775c3e6365dd10d40840a1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b54ae032e6ac34164d2a92ca05e02fc1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a37d17e7192da5512669116e22f0821c |
| publicationDate |
1996-05-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-H08129255-A |
| titleOfInvention |
Positive photoresist composition |
| abstract |
(57) [Summary] [Purpose] High resolution and small resolution dependence on film thickness, wide development latitude, less development residue, no precipitation of photosensitizer and generation of microgels over time (increased particles The purpose of the present invention is to provide a positive photoresist composition having extremely excellent storage stability. [Structure] Alkali-soluble resin and 1,2 of a polyhydroxy compound having 4 to 5 linear aromatic rings and one hydroxyl group in each aromatic ring and having a cycloalkyl group in the molecule. -Naphthoquinone diazide-5- (And / or -4-) sulfonic acid ester is contained. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-0034829-A1 |
| priorityDate |
1994-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |