http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H08120462-A

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filingDate 1994-10-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_95852797cbdb5b627740f39d5f46aa55
publicationDate 1996-05-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H08120462-A
titleOfInvention Wafer surface treatment equipment using chemicals
abstract (57) [Summary] [Purpose] To prevent the clogging of the filtration part and to efficiently perform the surface treatment on the wafer. [Structure] An overflow-type processing bath 1 for performing a surface treatment on a wafer 4 which is filled with a chemical liquid 3 and immersed in the chemical liquid 3, and an outer bath 2 for receiving the chemical liquid 3 overflowing from the processing bath 1 are pipes. 7 communicate with each other. A pump 5 and a filter unit 6 are provided in the pipe 7, which circulates the chemical liquid 3 and filters foreign substances in the chemical liquid 3. The filtration unit 6 is provided with a second temperature adjustment mechanism 20 that adjusts the temperature of the filtration unit 6 to a temperature at which a deposit is not generated from the chemical liquid 3, and clogging of the filtration unit 6 due to the deposits is prevented.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6357458-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006507404-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6241827-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018133558-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019206729-A
priorityDate 1994-10-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 31.