http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H08111458-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5d7576285d411d00c697e07270d2814a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3205 |
| filingDate | 1994-10-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_baff81ccbaa0d5563a782961262da7d8 |
| publicationDate | 1996-04-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H08111458-A |
| titleOfInvention | Semiconductor device and manufacturing method thereof |
| abstract | (57) [Summary] [Objective] The main feature of the present invention is to obtain a method for forming a highly reliable interlayer insulating film having sufficient flatness and sufficient interlayer dielectric strength. [Structure] A metal wiring pattern 2 is formed on a semiconductor substrate 1. To cover the surface of the metal wiring pattern 2, First oxide film 3 is formed on semiconductor substrate 1. Si—O—Si bond and Si are formed on the semiconductor substrate 1 so as to cover the metal wiring pattern 2 covered with the first oxide film 3. A polymer film 4 containing a -H group and having a three-dimensional molecular structure is formed. The polymer film 4 is subjected to plasma treatment with an inert gas, whereby the inert gas is introduced into the polymer film 4. Second on the plasma-treated polymer film 4 Oxide film 6 is formed. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7056825-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6255732-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6187662-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6479407-B2 |
| priorityDate | 1994-10-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457707758 http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24261 |
Total number of triples: 19.