| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8e43b4ca6b41ce9f54c9a895d474c81a |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 |
| filingDate |
1994-04-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7daca9d8df49e0837e41656ad6ce92d2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_94c42679cf1fdbbf171a3157a06c41f8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_87ca731d91a637aeaeb9d7cfc3786a5f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2ea6420fff1a8d6e9226d1eea40e08af |
| publicationDate |
1995-04-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-H0798504-A |
| titleOfInvention |
Positive photoresist composition |
| abstract |
(57) [Summary] [Structure] Alkali-soluble resin, 1,2-quinonediazide compound and formula (1) A positive photoresist composition containing a compound represented by: [Effect] The positive photoresist composition of the present invention is extremely useful for the production of semiconductor integrated circuits because it has extremely high sensitivity to radiation and the obtained resist pattern shape is excellent. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2000081700-A |
| priorityDate |
1993-08-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |