| abstract |
(57) [Summary] (Modified) [Purpose] To provide a method for forming a thin film pattern with excellent pattern accuracy at low cost. [Constitution] a) Formula provided on the substrate 101 (Wherein R 1 , R 2 , R 3 and R 4 are independently selected from the group consisting of a substituted or unsubstituted aliphatic hydrocarbon residue, an alicyclic hydrocarbon residue and an aromatic hydrocarbon residue. And m and n are integers), a step of selectively exposing the polysilane layer 102 made of polysilane having a structure represented by the formula 110 to ultraviolet rays 110 to form a latent image of the thin film pattern, and b) the thin film pattern. The polysilane layer 1 on which the latent image of A method of forming a thin film pattern, which comprises a step of immersing No. 02 in a metal oxide sol and then drying. |