| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_80787665b837ed3eb503bbcd27c0043a |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate |
1993-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_14924caa84d7b35be081483693708821
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b2b0bf2c76e1d65d4d5d2d8d419cbb5c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_943256b57958291b5ef6ddaf95c3aa77
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3ec434f73b011dccac79a589b926e715
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e7b3f11f9ec0c62330537ce1ad53ec72 |
| publicationDate |
1995-03-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-H0777802-A |
| titleOfInvention |
Pattern forming material, acid precursor and pattern forming method |
| abstract |
(57) [Summary] [Structure] An ester of an alcoholic hydroxyl group and an alkylsulfonic acid and a compound whose solubility in an alkaline aqueous solution is changed by the reaction of an acid. [Effect] The fine pattern required for manufacturing a semiconductor device can be efficiently formed at low cost. |
| priorityDate |
1993-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |