| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7f9af914ed2fb00cd4f1b8b1a28964e4 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G59-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F290-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F290-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F299-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G59-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G59-00 |
| filingDate |
1993-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_59c5719aa699473b35d39eeaff9e753c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_25921be25fb0f56352a962a192550616
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1f80e8212560f2a0affa6502bd088780 |
| publicationDate |
1995-03-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-H0770289-A |
| titleOfInvention |
Photosensitive resin composition |
| abstract |
(57) [Abstract] [PROBLEMS] To provide a photosensitive resin composition containing a photopolymerizable resin that can be developed in an alkali even if the amount of carboxyl groups is reduced and exhibits excellent resolution. [Structure] A compound represented by the following general formula with respect to one chemical equivalent of an epoxy group in an epoxy resin having two or more epoxy groups in one molecule: (However, R 1 represents hydrogen; an alkyl group; an alkenyl group; an aryl group which may have an alkyl group or an alkenyl group as a substituent; an alkanoyl group; an alkenoyl group having 5 or more carbon atoms; an aroyl group, and R 2 represents A photopolymerizable resin obtained by reacting hydrogen or a methyl group, R 3 represents a divalent organic group, and n is an integer of 1 to 50) (meth) acrylic acid and a polybasic acid anhydride. Is included. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5125100-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2012165055-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2005087831-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5110237-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109776756-A |
| priorityDate |
1993-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |