| abstract |
(57) [Summary] [Object] To provide a magnetic thin film having a high saturation magnetic flux density, excellent corrosion resistance and thermal stability, and suitable for a core material of a magnetic head. [Structure] A magnetic thin film is formed on a substrate 4 by sputtering in a vacuum chamber 2 of a sputtering apparatus. As the target 1, a Co chip and at least one chip of a platinum group element are placed on a Fe target. Thus, a magnetic thin film made of an alloy in which 0.1 to 5 at% of at least one platinum group element is added to the Fe—Co alloy having a Co content of 20 to 60 at% is formed. Furthermore, O2, N2, or CH4 gas may be introduced into the chamber 2 together with Ar gas to add at least one of N, C, and O to the thin film, or B may be dissolved in the Fe target to add B to the thin film. You may add. Furthermore, Ti, Zr, Hf, V, N You may add at least 1 sort (s) of b, Ta, Cr, Mo, and W. |