| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-58
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-5806
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G11B5-653
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-584
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-085 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G11B5-65
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G11B5-66
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G11B5-64
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G11B5-85
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G11B5-851
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-58 |
| filingDate |
1994-05-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d22413a8692164e308cc241343e95d0f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_288e40628ea8d66cf40cfb1cc2f1ac4e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c45207b227522f11d9b283b55115695b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_24e4c52209a63ebbc98e7dbab6590ed6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9ccf187ded14833ee305c80010eda03a |
| publicationDate |
1995-02-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-H0744853-A |
| titleOfInvention |
Thin film magnetic recording medium, magnetic disk drive, barium ferrite thin film manufacturing method, and longitudinal magnetic recording method |
| abstract |
(57) [Summary] [Objective] To provide a barium ferrite thin film having advantageous magnetic properties, corrosion resistance, durability, and unique texture. A thin film 60 has a top surface 65 and a bottom surface 67 that forms an interface with a substrate 70, and is of a barium ferrite target in a coaxial sputtering system that is parallel to the substrate and orients the sputtering target to face the substrate. It is deposited by reactive magnetron sputtering. This configuration is not limited to being strongly magnetically oriented perpendicular to the plane of the thin film, but exhibits higher deposition rates than sputtering systems that position the substrate perpendicular to the target around the plasma. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-9711457-A1 |
| priorityDate |
1993-05-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |