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filingDate 1994-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3046df747fbfe81214ebccaad6706adb
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publicationDate 1995-12-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H07333838-A
titleOfInvention Rubber type photoresist composition
abstract (57) [Abstract] [Purpose] A rubber-based photoresist composition mainly composed of cyclized rubber, which is capable of providing a uniform coating film thickness even when applied to a large substrate or a rectangular mounting substrate by spin coating. The object is to realize a photoresist composition. A rubber-based photoresist composition mainly composed of a cyclized rubber, characterized in that the solvent contains a solvent having a boiling point range of 150 to 220 ° C. When the rubber-based photoresist composition is dropped on the substrate 1 while rotating the substrate 1 at a high speed using a spinner, A thin film of the rubber-based photoresist composition is uniformly formed on the surface of the substrate.
priorityDate 1994-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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