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filingDate 1995-04-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4e7434c7fa64bed0f73d72c9923078ee
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publicationDate 1995-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H07331444-A
titleOfInvention Ferroelectric film forming method and apparatus
abstract (57) [Summary] [Purpose] It is possible to avoid high-temperature film formation, in which the film quality is deteriorated or a large amount of film forming raw material is required, and it is difficult to control the film thickness uniformity. And a device for forming a ferroelectric film capable of reliably controlling the film formation, suppressing the generation of particles that deteriorate the film quality, and capable of forming a film without significantly reducing or improving the film formation rate. I will provide a. [Structure] A raw material gas for film formation is turned into plasma by applying high-frequency power, and a substrate is exposed to this plasma to form a ferroelectric film on the base. Using a gas of an organic compound containing the constituent elements of the target ferroelectric film and a heterogeneous gas containing an oxygen element, plasma of the source gas is converted into basic high-frequency power of a predetermined frequency of 10 MHz or higher at a frequency of 1000 minutes. This is performed by applying high frequency power in a state where amplitude modulation is performed at a modulation frequency in the range of 1 or more and 1/10 or less.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013105832-A
priorityDate 1994-04-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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