http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H07325396-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_385752f237551ca1b257f160a0f2434b |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 |
| filingDate | 1994-05-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e2dd711e0514c0145e69b8c1c4c8870b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_191522f046bcc0166642306fc84b007f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bcaca05c42c4773193f47776e6d22268 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b9d2d0569fdc3ec549d6e88eaa03ecb0 |
| publicationDate | 1995-12-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H07325396-A |
| titleOfInvention | Positive type radiation sensitive resin composition |
| abstract | (57) [Summary] [Purpose] Effectively responds to various types of radiation, with excellent focus tolerance, sensitivity, resolution, developability, Provided is a positive-type radiation-sensitive resin composition which is useful as a resist having excellent pattern shape and heat resistance. The positive-type radiation-sensitive resin composition of the present invention comprises: a) ortho, ortho-bifunctional phenol such as para-cresol b) ortho-para-bifunctional phenol such as ortho-cresol c) trisphenol, for example: Structural formula (1) A positive-type radiation-sensitive resin composition comprising an alkali-soluble novolak resin obtained by polycondensing a phenol and an aldehyde, and a quinonediazide compound. |
| priorityDate | 1994-05-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 443.