http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H07320894-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_be055db3c1a09879df07379ba969e223 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3211 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32568 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F4-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 |
| filingDate | 1994-05-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3b350e9372351829687b53625b4c546e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6996d2533b1342f3c297e36728a0309e |
| publicationDate | 1995-12-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H07320894-A |
| titleOfInvention | Helicon wave plasma processing method and apparatus |
| abstract | (57) [Summary] [Object] To provide a compact helicon wave plasma processing method and apparatus capable of generating high-density plasma even in a relatively high vacuum, low damage, and easily compatible with large substrates. . An electrode 2 for mounting a substrate 3 is arranged in a vacuum container 1, a plurality of discharge tubes 5 are arranged on a wall surface of the vacuum container 1 facing the substrate 3, and a helicon is provided around each discharge tube 5. Antenna 6 And a static magnetic field generating coil 7 is provided so that the direction of the static magnetic field generated by at least one coil 7a of the plurality of static magnetic field generating coils 7 is opposite to the direction of the static magnetic field generated by the other coil 7b. Each static magnetic field generating coil 7a, An antenna high frequency power source 8 for supplying a direct current is provided at 7b. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H11251091-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2022046598-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110545612-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11721532-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011054993-A |
| priorityDate | 1994-05-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419556224 http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID2244 |
Total number of triples: 24.