abstract |
(57) [Summary] [Structure] a) Alkali-soluble resin in the presence of an acid, which comprises a) an alkali-soluble resin, b) a radiation-sensitive acid generator and c) an alkoxymethylated urea resin or an alkoxymethylated glycoluril resin. Radiation-sensitive resin composition containing a cross-linking agent capable of cross-linking a resin [Effect] Resist film excellent in sensitivity, developability, resolution, etc. and free from pattern swelling and pattern meandering during development Which is suitable as a chemically amplified negative resist composition for forming an ultraviolet ray such as i-line, deep ultraviolet ray such as excimer laser, It can be applied to both radiation such as X-rays such as synchrotron radiation and charged particle beams such as electron beams, and can be suitably used as a radiation-sensitive resin composition for manufacturing a semiconductor device. |