http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H07301915-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d93502a23a72b56472bc75854cfe7c60 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 1994-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_41e94e0cd6916d62e3ac1c2d275a1e65 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9608ab9e3cc60c8eb87832680e0ab899 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2bdc79a41ffccc3e9550ceddaee06be9 |
| publicationDate | 1995-11-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H07301915-A |
| titleOfInvention | Positive resist composition |
| abstract | (57) [Summary] [Objective] To provide a positive resist composition having an excellent balance of various properties such as sensitivity, residual film ratio, resolution and heat resistance. A positive resist composition containing an alkali-soluble resin and a quinonediazidesulfonic acid ester-based photosensitizer, characterized in that the photosensitizer contains a quinonediazidesulfonic acid ester of a polyhydroxy compound having a specific structure. Positive resist composition. |
| priorityDate | 1994-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 163.