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filingDate 1994-04-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_09f076f37a8d78ecd70610afafe794be
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publicationDate 1995-11-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H07299708-A
titleOfInvention Method for manufacturing silicon nitride ceramics component
abstract (57) [Summary] [Purpose] When grinding a silicon nitride-based sintered body to form a machine part with a predetermined shape, the reduction in strength due to grinding is dramatically recovered or improved, and high reliability is achieved. Provided is a method of manufacturing a silicon nitride ceramics part having the same. [Structure] α-Si 3 N having an average particle size of 0.5 μm or less 4 and a β'-sialon having an average major axis diameter of 3 μm or less and an average minor axis diameter of 1 μm or less, a 10-point average height roughness of the surface is 1 to 7 μm. Is ground to a specified size and then 800 in air By performing heat treatment in the temperature range of up to 1200 ° C. and then leaving it to cool, the residual stress of the ground surface before and after the heat treatment is the compressive residual stress, and A method for producing a silicon nitride ceramics component, wherein the ratio of the compressive residual stress before heating is 1 or more, preferably 5 or more.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101019706-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2014126178-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10086437-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004196633-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190063580-A
priorityDate 1994-04-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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