http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H07287391-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d93502a23a72b56472bc75854cfe7c60 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 |
| filingDate | 1994-04-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2ec638a4d886448dbed058935e1f0b63 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_221431d1460130d2cb2b51adda7a360c |
| publicationDate | 1995-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H07287391-A |
| titleOfInvention | Positive photosensitive composition |
| abstract | (57) [Summary] (Correction) [Purpose] To provide a positive photosensitive composition capable of forming a fine pattern in which foreign matter does not deposit upon long-term storage. A positive photoresist composition comprising an alkali-soluble novolac resin, a quinonediazide photosensitive compound (I) and a quinonediazide photosensitive compound (II) different from (I) dissolved in a solvent. The quinonediazide-based photosensitive compound (II) has the general formula (1) (R 1 to R 7 are each independently a hydrogen atom, a halogen atom, etc., and R 8 is a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, etc.); A positive photoresist composition, wherein at least a part of the phenolic hydroxyl groups of a condensate mixture of a phenol derivative different from the above and an aldehyde derivative is quinone diazide sulfonic acid esterified. |
| priorityDate | 1994-04-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 89.