| abstract |
(57) [Summary]n[Purpose] The present invention comprises a conductor layer, a semiconductor layer, and the like. Fine pattern of multi-layer structure can be formed continuously with one kind of liquid The purpose is to provide an etching agent. further, Electronic devices can be manufactured at high yield by shortening the manufacturing process. Aiming to provide a method of manufacturing an electronic device that can be manufactured To do.n[Structure] The etching agent of the present invention is fluorinated in a solution. Hydrochloric acid and general formula (XO n ) p- (However, X is a halogen element Prime, n is 3, 4, or 6, p is 1, 2 or 3) The halooxoate ion is 0.05 to 0.5 mol / l and 0.02 mol / l or more are included. To collect. In addition, in the solution, with hydrofluoric acid, the general formula (XO n ) p- (However, X is a halogen element, n is 3, 4, Or 6, p is halooxo represented by 1, 2 or 3) Characterized by containing an acid ion and a halogen precipitation inhibitor And |