http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H07263510-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5d7576285d411d00c697e07270d2814a |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-66 |
filingDate | 1994-03-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8c1e2fb67cd25bd0c3364ee2e4845637 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1c6493d1417a5369b11568e935f81bfb http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0838455f6e1eaebfd434246bc758c888 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_553cd417f1d5a5de0fa0b86f58dceb10 |
publicationDate | 1995-10-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-H07263510-A |
titleOfInvention | Silicon wafer crystal defect detection method |
abstract | (57) [Summary] [Purpose] To clearly detect crystal defects 10 in a silicon wafer. [Configuration] Etching time (x) is expressed in minutes, and the horizontal axis (x Axis), etching solution composition (y) When the vertical axis (y-axis) is represented by the volume mixing ratio of the 8.86 molar aqueous solution to the potassium dichromate 0.15 molar aqueous solution, the etching time and the etching solution composition are y = 1.9, x = 35 and y = -0.02x + A method for detecting a crystal defect in a silicon wafer having a value within a range surrounded by a straight line represented by 2. [Effect] The formation of the stain film can be prevented, and the crystal defect 10 can be clearly detected. |
priorityDate | 1994-03-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 21.