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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-54
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filingDate 1994-11-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_21747acfb77b0d181ab4dff0d66658d4
publicationDate 1995-10-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H07263364-A
titleOfInvention Plasma gas phase reaction method
abstract (57) [Summary] [Purpose] To form a film with a uniform thickness. A substrate is disposed between a pair of electrodes and has a floating potential with respect to the electrodes, the pair of electrodes is connected to one end and the other end of a matching coil, and the middle point of the matching coil is connected to a ground level. The voltage applied to each of the pair of electrodes is placed symmetrically with respect to the ground level.
priorityDate 1994-11-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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