| abstract |
(57) [Abstract] [Objective] An alkaline aqueous solution developable resist having excellent sensitivity to ultraviolet rays, electron beams, X-rays and other radiations and having high resolution, and a pattern forming method using the same. provide. [Structure] A water-repellent compound having a functional group that loses water repellency by a nucleophilic substitution reaction with an alkali or having two or more functional groups in a molecule that loses water repellency by a reaction with an alkali, and radiation irradiation. Alternatively, the resist composition includes a permeable variable composition in which the permeability of the alkaline aqueous solution is changed by irradiation with radiation and subsequent heat treatment. [Effect] semiconductor device, optical disk, magnetic head, Fine pattern formation required for manufacturing magnetic bubble elements, It can be done efficiently and at low cost. |