http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H07234505-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 |
| filingDate | 1994-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8fffc9ab1d382ccfd1a59ccc5eb62349 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7f08ea87295ed56b59dae70df070c234 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e400d3535749dac4ac0e924f9c30bdd2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9d893ea20efbe42083f3fd2ecee5638a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2f7dd25f28318bbb719403b5297fe6fc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_98f013b9fbfadcb1479fd616f0a75342 |
| publicationDate | 1995-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H07234505-A |
| titleOfInvention | Positive photoresist composition |
| abstract | (57) [Summary] [Structure] In a positive photoresist composition containing an alkali-soluble resin and a photosensitive component, the photosensitive component is quinonediazide sulfonic acid and the general formula: (Wherein k, l and m are integers of 0 or 1 to 3, n is 1 or 2) is an esterified product with at least one selected from the compounds represented by Rate 50% or more, diester content 60% on a molar basis The positive photoresist composition is as described above. [Effects] A resist pattern with high resolution, excellent cross-sectional shape and heat resistance can be formed, and with high sensitivity, excellent depth of focus characteristics and antihalation effect, and sufficient exposure margin. Particularly suitable for use on a substrate having irregularities or a substrate having high reflectance, and especially 64M-D Useful for forming ultra-fine patterns after RAM. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0840170-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-03100524-A1 |
| priorityDate | 1994-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 238.