http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H07230167-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6c8d4dc7bd1a30d8fda907fceaeb4e69 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 |
| filingDate | 1994-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_182b5dbd0907ba850d12db6ae1d7f9cb http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_68f6fb44fd3dab65dbf5c0d3581f3507 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_20c55d330817ba085801eb1ff3eb3cde |
| publicationDate | 1995-08-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H07230167-A |
| titleOfInvention | Photosensitive resin composition |
| abstract | (57) [Summary] [Object] To provide a photosensitive resin composition having a high resolution, a large exposure margin, and a high sensitivity, which is particularly useful as a photoresist. In a photosensitive resin composition containing an alkali-soluble resin, a quinonediazide-based photosensitive compound and a solvent, the alkali-soluble resin comprises a phenolic compound, (a) formaldehyde and (b) a specific carbonyl compound. It is a polycondensate, the mixing ratio (molar ratio) of (a) / (b) is 1/99 to 99/1, and among the condensed partial structures of the phenolic compound and (b) the specific carbonyl compound, A photosensitive resin composition using a resin having a dimer structure in a specific range. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004170413-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013110383-A |
| priorityDate | 1993-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 196.