http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H07209861-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8e43b4ca6b41ce9f54c9a895d474c81a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 1994-01-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7daca9d8df49e0837e41656ad6ce92d2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_94c42679cf1fdbbf171a3157a06c41f8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2ea6420fff1a8d6e9226d1eea40e08af http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_87ca731d91a637aeaeb9d7cfc3786a5f |
| publicationDate | 1995-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H07209861-A |
| titleOfInvention | Positive type radiation sensitive resin composition |
| abstract | (57) [Summary] [Structure] A positive photoresist composition containing an ester obtained by an esterification reaction of a terpene phenol with 1,2-naphthoquinonediazide sulfonyl chloride and an alkali-soluble resin is dissolved in a solvent. Use as a photosensitizer. This photosensitive solution is applied on a substrate such as a silicon wafer, then baked and dried, then irradiated with radiation such as ultraviolet rays through a mask on which a fine pattern is drawn, further baked, and then developed with an alkaline aqueous solution. By doing so, a resist pattern is obtained. [Effect] The positive photoresist composition of the present invention is extremely useful in the manufacture of semiconductor integrated circuits because it has extremely high resolution and the obtained resist pattern shape is excellent. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015532649-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008058548-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-9849601-A1 |
| priorityDate | 1994-01-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 66.