http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H07209535-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_242cc8d15c771395b920cc7de452da6a |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B6-13 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C22-70 |
filingDate | 1994-01-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a382316a0d029a32fcaf4b7940f8cbcf http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4c78d8954b03073804456c14a33ac802 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_317a17e61ddb10299c77b14ea7644036 |
publicationDate | 1995-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-H07209535-A |
titleOfInvention | Method for manufacturing optical waveguide substrate |
abstract | (57) [Summary] [Objective] In a method of forming a high-refractive index layer on a substrate material by a proton exchange method and then annealing it, the insertion loss of the optical waveguide is reduced and the variation of the insertion loss of the optical waveguide is reduced. And to prevent the surface state of the substrate material from becoming rough or the crystal lattice from being disturbed. [Structure] A material to be treated containing a substrate material composed of an electro-optic crystal such as LiNbO 3 or LiTaO 3 is subjected to a proton exchange treatment to form a high refractive index layer on the material to be treated. Then, the material to be treated is kept at a temperature of 380 ° C. to 450 ° C. for 3 minutes or more, and 1 Annealing is performed for a time or less to diffuse H 1 + in the high refractive index layer. |
priorityDate | 1994-01-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 20.