http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0720639-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5128cfc84a0fb189fceb3cd240c44493 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D179-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 |
| filingDate | 1993-07-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f0fc27b9af9936d3734acccfde4e2d8b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a85ae08937eeed6bf5636b25300f9f9b |
| publicationDate | 1995-01-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H0720639-A |
| titleOfInvention | How to form a pattern |
| abstract | (57) [Summary] [Structure] In a method for forming a predetermined pattern from a photosensitive composition containing a photosensitive polyimide precursor, 10 volume percent or more of a compound represented by the following formula [II] and liquid at room temperature is included. A pattern forming method characterized by using a rinse liquid. [Chemical 1] [Effect] In the method of forming a predetermined pattern from a photosensitive composition containing a photocrosslinkable polymer, a thin film does not remain at the bottom of the via hole after development, scum due to rinse shock does not occur, and the exposed area is not damaged. You can get the pattern. |
| priorityDate | 1993-07-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 52.