http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H07205563-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41N1-08
filingDate 1994-01-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cfed64184bb50de855d8f5cb11b0b566
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1e59221ba84c125c35137f670e26108e
publicationDate 1995-08-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H07205563-A
titleOfInvention Process for producing photosensitive lithographic printing plate support
abstract (57) [Summary] [Purpose] The design embodied on a part of the back surface of the support of the photosensitive lithographic printing plate does not adversely affect the photosensitive resin layer without requiring a large capital investment or increase in running cost. Provided is a photosensitive lithographic printing plate which does not affect the development, maintains its high design even after the development process is completed, and improves the added value. [Structure] An electrochemical roughening method is not used. One method is to embody a desired arbitrary shape on a surface on which a photosensitive resin layer is not provided by an inkjet method, and then form a metal oxide on the surface. , A method of applying a coating layer containing an organic polymer compound and a plasticizer, and another method is to adhere a plate with good alkali resistance in which a desired arbitrary design shape is formed on the surface on which the photosensitive resin layer is not provided. Then, the chemical etching is performed by using an alkaline etching solution.
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priorityDate 1994-01-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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