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filingDate 1994-12-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 1995-08-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H07201871-A
titleOfInvention Metal contact formation method
abstract (57) [Abstract] [Purpose] A method for connecting an integrated circuit chip to a substrate is provided. A CrCu layer is blanket deposited onto a completed wafer with terminal vias etched into the insulator. PbSn solder dots are then formed by electroplating or vapor deposition. The copper layer is etched using the solder dots as a mask. Next, the solder dots are melted / re-solidified to form an oblate sphere or a ball. Further, a positive photoresist 16 is applied so as to be distributed around the bottoms of the solder balls. The solder balls are used as a self-aligned exposed mask. Since the photoresist 16 under the solder balls is not exposed, a photoresist protective ring is created in that area after development. This guard ring protects the copper-solder contact surface and is used as a mask when etching the chrome layer.
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