http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H07194932-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_51c974cedbde502517415bb87efa4e0c |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-77 |
filingDate | 1993-12-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3119c6326110e27554641c001d67402f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f7e7965b8abc1ed36a56d32400a668ea http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1e4e6d708db390fb02b5247542cd3834 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0b6a342ba7295557de13a32b259325f9 |
publicationDate | 1995-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-H07194932-A |
titleOfInvention | Gas introduction mechanism used in multi-tube gas-liquid contactor |
abstract | (57) [Summary] [Purpose] A gas introduction mechanism used in a multi-tube gas-liquid contactor having a structure in which a large number of gas introduction tubes having a plurality of gas ejection holes on the lower peripheral wall are vertically suspended in a liquid. A large amount of fluctuation of the floss layer in the liquid tank is prevented, and a gas introduction mechanism having excellent gas treatment performance is provided. [Structure] A gas having a structure in which a large number of gas introduction pipes having a plurality of gas ejection holes on a lower peripheral wall surface in a large liquid tank are vertically installed so that the gas ejection holes are located below a stationary liquid surface in the liquid tank. A gas introduction mechanism used in a liquid contact device, comprising a gas introduction pipe, an outer cylinder surrounding the gas introduction pipe, and a support for supporting the outer cylinder on the gas introduction pipe, and the lower end of the outer cylinder introduces the gas. Multi-tube gas-liquid contact, characterized in that it is located at the same level as the gas ejection holes of the pipe or in the vicinity thereof, and the ratio of the cross-sectional area of the outer cylinder to the cross-sectional area of the gas introduction pipe is in the range of 1.5 to 10. Gas introduction mechanism used in the device. |
priorityDate | 1993-12-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Predicate | Subject |
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isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID71343643 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID453380850 |
Total number of triples: 18.