| abstract |
(57) [Summary] [Structure] (A) Propylene glycol monoalkyl ether and (B) General formula R 1 O (CH 2 ) n COOR 2 (R 1 and R 2 are lower alkyl groups, and n is 2 to 4) Solvent for cleaning and removing resist containing a compound represented by the following, and a resist forming coating material is applied to a base material by a spinner, and then unnecessary resist forming coating material adhered to the peripheral portion, edge portion and back surface portion of the base material. A method for producing a base material for producing an electronic component, wherein: is previously removed with the solvent. [Effect] It is a solvent for resist cleaning and removal, which has excellent resist solubility, low toxicity, and stable solubility over time with no residue or precipitates. A base material for producing parts can be efficiently obtained. |