| abstract |
(57) [Summary] [Purpose] Excellent developability even when the acid value (mgKOH / g) is small, Provided are a resist ink composition having excellent developability even if the solvent is dried for a long time, and a cured product thereof having properties sufficiently satisfying hardness, solder heat resistance, gold plating resistance and the like, and a cured product thereof. A resist ink composition comprising a specific unsaturated group-containing polycarboxylic acid resin (A), a photopolymerization initiator (B), a diluent (C) and a curing component (D), and the same. Cured product. |