| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_80787665b837ed3eb503bbcd27c0043a |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C271-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G18-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
1993-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b31839cb447e88858678f37fc5a31fbb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3020d4c0aaa98b2b097861212331b07f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5d35effd78f73751664fa96d08012f15
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_218c0648e5d595702271f8f8f1c3a04b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_67e192438b740d5b5bb36a94de3c588d |
| publicationDate |
1995-06-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-H07140663-A |
| titleOfInvention |
PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD USING THE COMPOSITION, AND ELECTRONIC DEVICE MANUFACTURING METHOD USING THE SAME |
| abstract |
(57) [Summary] [Object] To provide a positive photosensitive resin composition developable with an aqueous solvent. A photosensitive resin composition comprising a polymer having a carboxylic acid group and a photobase generator capable of generating a base upon irradiation with electromagnetic waves. [Effect] By providing a positive photosensitive resin composition that can be developed with a water solvent system, it is possible to prevent environmental pollution, improve the working environment, and increase the density and reliability of applied products. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6261736-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007098844-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6017683-A |
| priorityDate |
1993-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |