http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H07140659-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L79-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 1993-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c428e2a9d6a42bbd821e498fdc08fd94 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_23cfb055bf88286becaa503a8173bab7 |
| publicationDate | 1995-06-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H07140659-A |
| titleOfInvention | Photosensitive resin composition |
| abstract | (57) [Summary] [Structure] This photosensitive resin composition comprises (A) the following general formula: (In the formula, X is a tetravalent organic group containing an aromatic ring or an aliphatic ring, Y is a divalent organic group, and R 1 to R 3 are a hydrogen atom or a monovalent group having 1 to 10 carbon atoms. Hydrocarbon group, m is 10 It is characterized by containing a polymer having a structural unit represented by the above integer) and (B) a photosensitive acid generator. [Effect] It has a good sensitivity, does not cause swelling during development, and gives a patterned polyimide resin film easily. This film can be suitably used as a protective film for electronic parts. |
| priorityDate | 1993-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 99.