| abstract |
(57) [Summary] [Structure] (A) Alkali-soluble resin and (B) quinonediazide group-containing compound, (C) (a) alkyl 2-oxypropionate and (b) propylene glycol monoalkyl ether acetate (C) A positive resist composition prepared by dissolving it in a mixed solvent with a (c) hydrocarbon-based organic solvent that is optionally used. [Effect] A positive resist composition having excellent coating properties, storage stability, step coverage, and safety, which is suitable for use in manufacturing electronic component materials. |