http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H07135324-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-336
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1368
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filingDate 1993-11-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_090d5e6e668ef9f0c44e2fc2656acff0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_06c2a67fb99e7382117013c02604c37c
publicationDate 1995-05-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H07135324-A
titleOfInvention Thin film semiconductor integrated circuit
abstract (57) [Summary] [Object] To obtain excellent performance in a monolithic active matrix circuit including an active matrix circuit formed using thin film transistors (TFTs) and a peripheral circuit for driving the same. And [Configuration] TFT using an amorphous or substantially amorphous semiconductor in an active matrix circuit In the peripheral circuit, a top gate type TFT using a semiconductor crystallized by irradiation of a laser or strong light equivalent thereto is used. Further, at least the TFT of the peripheral circuit has a silicide region, a channel formation region, and a high resistance region sandwiched between them in the active layer. By doing so, the leak current is small in the active matrix region and the charge retention characteristics are improved, while the peripheral circuits can operate at high speed. As a result, a large-scale matrix or the like having more than 1000 scanning lines can be manufactured.
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006066491-A
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priorityDate 1993-11-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 36.