| abstract |
(57) [Abstract] [Purpose] The drawbacks of conventional cationic photopolymerization compositions (when applied to the photosensitive layer of a photosensitive lithographic printing plate, photoresist, etc., are all sensitivity and chemical resistance (for etching or Provided is a photosensitive composition which is improved in sensitivity (in lithographic printing) and mechanical strength is insufficient), has high sensitivity, and is excellent in chemical resistance and mechanical strength. A photosensitive composition containing a microgel dispersible in an organic solvent, a compound having a vinyl ether group or a propenyl ether group, and a photoacid generator. A photosensitive composition comprising a microgel having on its surface at least one selected from a vinyl ether group and a propenyl ether group and at least one ring selected from oxirane, thiirane, oxetane and thietane. |