http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H07120918-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate | 1993-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4d1a0527009e3d4221e730ccf8a30ffa http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7f08ea87295ed56b59dae70df070c234 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8fffc9ab1d382ccfd1a59ccc5eb62349 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7781c815ad86ec41feb2a543fffc8f68 |
publicationDate | 1995-05-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-H07120918-A |
titleOfInvention | Positive resist solution |
abstract | (57) [Summary] [Structure] In a positive resist solution prepared by dissolving an alkali-soluble resin and a quinonediazide group-containing compound in an organic acid ester, the organic acid ester has an acid value of 0.0 Use 5 mg / g or less. As the organic acid ester, fatty acid alkyl or acetic acid ester of alkylene glycol or its monoalkyl ether is preferable. [Effect] There is no precipitation of the photosensitive component of the resist and no change in sensitivity with time, excellent storage stability, high resolution and wide defocus margin, which are particularly suitable for semiconductor device manufacturing. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100563184-B1 |
priorityDate | 1993-01-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 138.