| abstract |
(57) [Summary] [Structure] Containing an alkali-soluble resin, for example, the following formula: A radiation-sensitive resin composition comprising a 1,2 quinonediazide sulfonic acid ester of the compound represented by [Effect] The radiation-sensitive resin composition of the present invention is excellent in developability and pattern shape, has high sensitivity, and is particularly remarkably improved in focus tolerance. Therefore, the present composition can be suitably used as a resist for producing a highly integrated integrated circuit. |