http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H07113171-A

Outgoing Links

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34
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filingDate 1993-10-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f0515d44ab6e7a258879ff19848abcae
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publicationDate 1995-05-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H07113171-A
titleOfInvention Sputtering method for titanium ceramics film
abstract (57) [Summary] [Purpose] Two different types of ceramic coating films were laminated on the surface of a die-casting die whose base material was an iron-based material to improve heat resistance and prolong life. An object of the present invention is to provide a sputtering method for obtaining a die-casting mold easily and with high efficiency. [Structure] A Ti layer is first formed on the surface of a die casting mold by switching the position of the target plasma generated during film formation by controlling the magnetic field in the cathode using a target having a TiAl material in the center and a Ti material in the outer periphery. Coating, then T The iAlN layer film is formed. When the TiAlN layer is formed, a substrate bias voltage is applied to the mold to improve the film quality by the ion assist effect.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0603486-A2
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priorityDate 1993-10-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 23.