http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0711309-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5e5c121269689cbab9b3a4548b15caf3 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-24 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B22F9-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J19-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-22 |
| filingDate | 1993-06-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eb05f971d79a336265eac1fcf31ecf32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1af49da7ea2deb6b150a1f50fcb3abcb |
| publicationDate | 1995-01-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H0711309-A |
| titleOfInvention | Method for producing compound ultrafine particles |
| abstract | (57) [Summary] (Revised) [Purpose] A compound superfine particle size and composition was precisely controlled by utilizing the phenomenon of spontaneous alloying that occurs in ultrafine particles with a particle size of several nanometers at room temperature or below. Fine particles, especially CdSe, Au Zn, AuSb 2 , InSb, GaAs, AlSb, Z nSe, AuPb 2 , Au 2 Pb, CdS, SiNi, A method for producing compound ultrafine particles for efficiently obtaining a photocatalyst such as Si 2 Ni, a compound semiconductor, and a superconducting material. [Structure] After depositing the first element on the surface of the substrate material 1 by a vacuum vapor deposition, a sputtering method, a CVD method, or an electron beam vapor deposition so as to have a grain size of 2 to 30 nm, which is equal to or less than the critical size, the second and subsequent elements are deposited. Is deposited to a size of 2 to 50 nm, the reaction temperature is 32 ° C. or lower to −173 ° C., and the vacuum condition is 10 -11 to 10 -1 Torr is caused to react on the substrate 1 at a vacuum degree, and the first element and the second and subsequent elements are spontaneously alloyed to form the compound 4. A method for producing compound ultrafine particles, which comprises sequentially depositing at an area density. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012217970-A |
| priorityDate | 1993-06-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 49.