http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0676625-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_14c9ad767fb6d5e9dabfb770d4e82252 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10N50-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G11B5-3903 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L43-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G11B5-39 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01B3-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01B3-00 |
filingDate | 1993-06-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c71ff6543927ba2902a5c1b44e751495 |
publicationDate | 1994-03-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-H0676625-A |
titleOfInvention | Multilayer dielectric member and method of forming the same |
abstract | (57) [Abstract] [Purpose] To provide a dielectric material that realizes insulation between two layers that are extremely close to each other. A member used as a dielectric for separating at least two layers of a multilayer structure (for example, a magnetoresistive transducer) is tantalum (Ta) or hafnium (H). f), an oxide thin film of a metal selected from zirconium (Zr), yttrium (Y), titanium (Ti), or niobium (Nb). The oxide thin film is oxidized and formed by either oxygen plasma, exposure to oxygen at high temperature, exposure to oxygen under UV irradiation, or a combination thereof. |
priorityDate | 1992-06-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 29.