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filingDate 1993-05-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 1994-03-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H0661601-A
titleOfInvention Metallization layer and method of forming the same
abstract (57) [Summary] [Object] To provide a metallization layer having improved adhesion between a substrate and a metal. A metallization layer is embedded in the substrate and is adjacent to the metallization layer. Including 20. Adhesion is improved by removing moisture from the surface of the substrate by heating. High adhesion is also obtained by depositing a mixture of metals including chromium and copper. The chromium to copper ratio is initially high and decreases as the deposition process progresses. Completion of the process is determined by approaching the required final ratio of chromium to copper observed by emission spectroscopy. The process can be carried out continuously using a multi-chamber vacuum sputtering system.
priorityDate 1992-06-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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