| abstract |
(57) [Summary] [Structure] An alkali-soluble resin, a compound that generates an acid upon irradiation with radiation, and a cross-linking agent having a plurality of alkoxyalkyl groups directly bonded to an aromatic ring, for example, represented by the following formula (1). [Chemical 1] A negative-type radiation-sensitive resin composition comprising: [Effect] As a negative resist excellent in sensitivity, developability, resolution, pattern shape, heat resistance and residual film property and free from pattern swelling or pattern meandering during development, especially ultraviolet rays, It can be suitably used as a negative resist for manufacturing integrated circuits, which is sensitive to radiation such as deep ultraviolet rays, X-rays, electron beams, molecular beams, γ rays, synchrotron radiation, and proton beams. |