| abstract |
(57) [Summary] [Structure] (a) Alkali-soluble resin, and (b) 2, 3, 4, An ester comprising 4'-tetrahydroxybenzophenone and 1,2-naphthoquinonediazide-4-sulfonic acid, wherein the total content of monoester, diester and triester is 99% by weight or more. A radiation-sensitive resist composition comprising: [Effect] A positive radiation sensitive resist composition having excellent dry etching resistance and resolution and high sensitivity can be obtained. |