http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H06337524-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5431dd30de06069f30d1f50e42a7a0c3 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 1993-05-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_20669826a34935aeae6786684d02a34a |
| publicationDate | 1994-12-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H06337524-A |
| titleOfInvention | Hardening agent and method for hardening photoresist patterning film |
| abstract | (57) [Summary] [Purpose] A non-toxic hardener that replaces the highly toxic, high-concentration chromium-containing hardeners used to harden photoresist patterning films. The effect of improving the water resistance and the etching resistance is to provide a hardening agent which is equal to or more than a chromium-containing hardening agent and a hardening method using the hardening agent. [Structure] A hard film for curing a photoresist patterning film obtained by exposing a light image on a water-soluble photoresist film formed on an etched body by active light and developing the exposed film. The treating agent is characterized by containing a zirconium-containing compound as an active ingredient. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9659824-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9563122-B2 |
| priorityDate | 1993-05-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 57.